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HfSiO thin film Growth by Atomic Layer Deposition for alternative gate dielectrics for OTFT devices
- Title
- HfSiO thin film Growth by Atomic Layer Deposition for alternative gate dielectrics for OTFT devices
- Authors
- 용기중
- Date Issued
- 2010-06-20
- Publisher
- American Vacuum Society
- Article Type
- Conference
- Citation
- 10th International Conference on Atomic Layer Deposition, 2010-06-20
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