An Experimental Study on Channel Backscattering in High-k/Metal Gate nMOSFETs
- Title
- An Experimental Study on Channel Backscattering in High-k/Metal Gate nMOSFETs
- Authors
- 정윤하
- Date Issued
- 2012-10-14
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/63810
- Article Type
- Conference
- Citation
- 2012 IEEE International Integrated Reliability Workshop, 2012-10-14
- Files in This Item:
- There are no files associated with this item.
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