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초음속 나노입자빔을 이용한 실리콘 웨이퍼 표면오염입자(10nm) 제거 실험ㄴ

Title
초음속 나노입자빔을 이용한 실리콘 웨이퍼 표면오염입자(10nm) 제거 실험ㄴ
Authors
이진원김인호
POSTECH Authors
이진원
Date Issued
16-Feb-2012
Publisher
한국반도체 협회
URI
http://oasis.postech.ac.kr/handle/2014.oak/63114
Article Type
Conference
Citation
제19회 한국반도체 학술대회, 2012-02-16
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이진원LEE, JIN WON
Dept of Mechanical Enginrg
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