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The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs
- Title
- The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs
- Date Issued
- 2009-11-18
- Publisher
- JAP
- Article Type
- Conference
- Citation
- International Microprocesses and Nanotechnology Conference, 2009-11-18
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Related Researcher
- 김오현KIM, OHYUN
- Dept of Electrical Enginrg