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In-situ synchrotron X-ray scattering study on the initial structure of Ru-metal Atomic Layer Deposition films for the electronic devices.
- Title
- In-situ synchrotron X-ray scattering study on the initial structure of Ru-metal Atomic Layer Deposition films for the electronic devices.
- Date Issued
- 2009-04-13
- Publisher
- Material Research Society
- Article Type
- Conference
- Citation
- 2009MRS Spring Meeting, 2009-04-13
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