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In-situ synchrotron X-ray scattering study on the initial structure of Ru-metal Atomic Layer Deposition films for the electronic devices.

Title
In-situ synchrotron X-ray scattering study on the initial structure of Ru-metal Atomic Layer Deposition films for the electronic devices.
Authors
백성기박용준이한보람김우희이동열김형준이시우
Date Issued
13-Apr-2009
Publisher
Material Research Society
URI
http://oasis.postech.ac.kr/handle/2014.oak/58541
Article Type
Conference
Citation
2009MRS Spring Meeting, 2009-04-13
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