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Low‐Frequency Noise Analysis in HfO2HfO2/SiON Gate Stack nMOSFETs with Different Interfacial Layer Thickness
- Title
- Low‐Frequency Noise Analysis in HfO2HfO2/SiON Gate Stack nMOSFETs with Different Interfacial Layer Thickness
- Date Issued
- 2010-07-25
- Publisher
- AIP
- Article Type
- Conference
- Citation
- ICPS 2010 (30th), 2010-07-25
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg