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Conformal, low-damage shallow junction technology (Xj~5nm) with optimized contacts for FinFETs as a Solution Beyond 14nm Node

Title
Conformal, low-damage shallow junction technology (Xj~5nm) with optimized contacts for FinFETs as a Solution Beyond 14nm Node
Authors
백록현옥인조K.-W.AngC.Hobbs강창용J.SnowP.NunanS.NadaharaP.KirschR.Jammy
Date Issued
2012-05-14
Publisher
IEEE
URI
https://oasis.postech.ac.kr/handle/2014.oak/49476
Article Type
Conference
Citation
IEEE IWJT (2012), 2012-05-14
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백록현BAEK, ROCK HYUN
Dept of Electrical Enginrg
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