Reliability properties in sub-50 nm high performance high-k.metal gate stacks SiGe pMOSFETs
- Title
- Reliability properties in sub-50 nm high performance high-k.metal gate stacks SiGe pMOSFETs
- Authors
- 이정수
- Date Issued
- 2010-10-12
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/47643
- Article Type
- Conference
- Citation
- IEEE Nanotechnology Materials and Devices conference, 2010-10-12
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.