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Carbon nanotube-induced chemical etching of SiO2 layer for sub-10 nm lithography and its mechanism study

Title
Carbon nanotube-induced chemical etching of SiO2 layer for sub-10 nm lithography and its mechanism study
Authors
최희철변혜령
Date Issued
2007-11-27
Publisher
Material research societ
URI
https://oasis.postech.ac.kr/handle/2014.oak/47044
Article Type
Conference
Citation
2007 MRS Fall Meeting, 2007-11-27
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