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Plasma enhanced atomic layer deposition of TaCxNy thin film with TBTDET and methane/hydrogen gas for NMOSFET gate electrode

Title
Plasma enhanced atomic layer deposition of TaCxNy thin film with TBTDET and methane/hydrogen gas for NMOSFET gate electrode
Authors
이시우조기희
Date Issued
2010-06-22
Publisher
ALD 2010
URI
https://oasis.postech.ac.kr/handle/2014.oak/46938
Article Type
Conference
Citation
10th International Conference on Atomic Layer Deposition, Seoul Education Culture Center, 2010-06-22
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