Open Access System for Information Sharing

Login Library

OASIS Repository@POSTECHLIBRARY

Browsing "1. Journal Papers" by SubjectX-ray lithography

전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

All 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:

Sort by:
In order:
Results/Page
Authors/Record:

Showing results 1 to 2 of 2

Article

Characterization of proximity correction in 100-nm-regime X-ray lithographySCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 37, no. 12B, page. 6824 - 6829, 1998-12

Article

Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithographySCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 39, no. 12B, page. 6942 - 6946, 2000-12

1

OAK

개인정보처리방침 Personal Information Protection Policy

library@postech.ac.kr Tel: 054-279-2548

Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.

Browse

Login Library Help