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TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROSCOPY USING SYNCHROTRON RADIATION FOR TRACE IMPURITY ANALYSIS OF SILICON WAFER SURFACES

Title
TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROSCOPY USING SYNCHROTRON RADIATION FOR TRACE IMPURITY ANALYSIS OF SILICON WAFER SURFACES
Authors
C. H. ChangY. M. KooH. Padmore
POSTECH Authors
Y. M. Koo
Date Issued
Jan-1996
Publisher
대한금속재료학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/38508
Article Type
Article
Citation
METALS AND MATERIALS INTERNATIONAL, vol. 2, no. 1, page. 23 - 29, 1996-01
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구양모KOO, YANG MO
Ferrous & Energy materials Technology
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