Improved threshold switching characteristics of multi-layer NbOx for 3-D selector application
SCIE
SCOPUS
- Title
- Improved threshold switching characteristics of multi-layer NbOx for 3-D selector application
- Authors
- Park, J; Cha, E; Lee, D; Lee, S; Song, J; Park, J; Hwang, H
- Date Issued
- 2015-11-01
- Publisher
- ELSEVIER SCIENCE BV
- Abstract
- In this paper, a multi-layer NbOx selector is fabricated and compared with a single-layer NbOx selector. The multi-layer NbOx selector exhibits better performances (<1/5 leakage current, x5 selectivity and >10(6) endurance) than the single-layer NbOx selector. By using a conductive atomic force microscopy (C-AFM), we revealed that numerous leakage paths in the NbOx film can be suppressed by adopting an insulating barrier layer within the multi-layer NbOx selector. (C) 2015 Elsevier B.V. All rights reserved.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/35497
- DOI
- 10.1016/J.MEE.2015.04.045
- ISSN
- 0167-9317
- Article Type
- Article
- Citation
- MICROELECTRONIC ENGINEERING, vol. 147, page. 318 - 320, 2015-11-01
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- There are no files associated with this item.
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