Silicidation of Mo-alloyed ytterbium: Mo alloying effects on microstructure evolution and contact properties
SCIE
SCOPUS
- Title
- Silicidation of Mo-alloyed ytterbium: Mo alloying effects on microstructure evolution and contact properties
- Authors
- Na, S; Kang, JG; Choi, J; Lee, Nam-Suk; Park, CG; Kim, H; Lee, SH; Lee, HJ
- Date Issued
- 2015-06-15
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Abstract
- In this study, we investigated the effects of Mo addition to Yb as a contact material with Si for metal oxide-semiconductor field-effect transistors (MOSFETs) to mitigate oxidation problems, a persistent problem for rare-earth metal-based contacts (such as Yb/Si and Er/Si). Our thorough materials characterization using transmission electron microscopy and X-ray diffraction unravels Mo segregation during silicidation and its effect against oxidation. I-V characteristics, measured from Schottky diodes produced from the samples, reflect such microstructure evolution and demonstrate a strong improvement in contact properties at high temperatures. (C) 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
- Keywords
- Yb silicide; Mo-alloyed ytterbium; Epitaxial layer; Schottky barrier height; Thermal stability
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/35354
- DOI
- 10.1016/J.ACTAMAT.2015.03.041
- ISSN
- 1359-6454
- Article Type
- Article
- Citation
- ACTA MATERIALIA, vol. 92, page. 1 - 7, 2015-06-15
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- There are no files associated with this item.
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