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화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제

Title
화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제
Authors
양승관박찬언강종희안광덕
POSTECH Authors
박찬언
Date Issued
Jan-1994
Publisher
한국고분자학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/32946
ISSN
0379-153X
Article Type
Article
Citation
POLYMER-KOREA, vol. 18, no. 4, page. 622 - 631, 1994-01
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박찬언PARK, CHAN EON
Dept. of Chemical Enginrg
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