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Wettability of dual-scaled surfaces fabricated by the combination of a conventional silicon wet-etching and a ZnO solution method SCIE SCOPUS

Title
Wettability of dual-scaled surfaces fabricated by the combination of a conventional silicon wet-etching and a ZnO solution method
Authors
Hyungmo KimKim, MHKim, J
Date Issued
2009-09
Publisher
IOP PUBLISHING LTD
Abstract
We introduce effective dual-scaled surfaces using the combination of the conventional silicon wet-etching technique (for microstructures) and a solution method for ZnO nanorod formation (for nanostructures). The microstructures were sloped to facilitate the overall deposition of a ZnO seed layer as well as the growth of nanostructures over the entire surface area. The ZnO nanorods were formed using growth solutions of various pHs. The fabricated dual-scaled surfaces were also coated with hydrophobic self-assembled monolayers (SAMs) and compared with the surfaces without the SAM coating to examine the structural effects on both hydrophilic and hydrophobic regions. A total of 16 different samples were examined and analyzed systematically by comparing the static (i.e. the contact angle) and dynamic (i.e. spreadability and contact angle hysteresis) wettability.
Keywords
SUPERHYDROPHOBIC SURFACES; CONTACT-ANGLE; NANORODS; ROUGHNESS; GROWTH; FILMS; TOPOGRAPHY; WATER
URI
https://oasis.postech.ac.kr/handle/2014.oak/31026
DOI
10.1088/0960-1317/19/9/095002
ISSN
0960-1317
Article Type
Article
Citation
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, vol. 19, no. 9, 2009-09
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