Fabrication of needle-like nanostructures using block copolymer for non-volatile memory
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SCOPUS
- Title
- Fabrication of needle-like nanostructures using block copolymer for non-volatile memory
- Authors
- Jung, S; Kim, K; Park, DH; Sohn', BH; Jung, JC; Zin, WC; Hwang, S; Dhungel, SK; Yoo, J; Yi, J
- Date Issued
- 2007-09
- Publisher
- ELSEVIER SCIENCE BV
- Abstract
- In this work, the fabrication of nanostructures applicable to nano floating gate memory is investigated by using a block co-polymer system composed of Polystyrene (PS) and Polymethylmethacrylate (PMMA). A thin film of self-assembled block copolymer has been used during all experiments for nanostructures with critical dimensions below photolithographic resolution limits. Under suitable conditions, the PS and PMMA self assembled into a honey comb lattice of PMMA in the matrix of PS. Nanoporous thin film from PS-b-PMMA diblock co-polymer thin film with selective removal of PMMA domains was used to fabricate needle-like nanostructures. The reactive ion etching (RIE) was then carried out at room temperature in a single wafer RIE system with the substrate having nano-cylindrical structures. The plasma was excited by radio frequency. Diverse surface nanostructures of sub-100 nm patterning were fabricated by plasma etching using block co-polymer. Finally, we have demonstrated that by combining these self assembled block co-polyrners with regular semiconductor processing, a non-volatile memory device with increased charge storage capacity over planar structures can be realized. (C) 2006 Elsevier B.V. All rights reserved.
- Keywords
- nanostructure; RIE; block co-polymer; nanomask; nano floating gate memory (NFGM)
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/29512
- DOI
- 10.1016/J.MSEC.2006.
- ISSN
- 0928-4931
- Article Type
- Article
- Citation
- MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, vol. 27, no. 39941, page. 1452 - 1455, 2007-09
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