STUDIES OF THE GAS-PHASE REACTIVE INTERMEDIATES FORMED BY HETEROGENEOUS PROCESSES IN CHLOROSILANE CHEMICAL VAPOR-DEPOSITION USING PHOTOELECTRON-SPECTROSCOPY AND MASS-SPECTROMETRY
SCIE
- Title
- STUDIES OF THE GAS-PHASE REACTIVE INTERMEDIATES FORMED BY HETEROGENEOUS PROCESSES IN CHLOROSILANE CHEMICAL VAPOR-DEPOSITION USING PHOTOELECTRON-SPECTROSCOPY AND MASS-SPECTROMETRY
- Authors
- G. H. Kruppa; S. K. Shin; J. L. Beauchamp
- Date Issued
- 1990-01-11
- Publisher
- AMER CHEMICAL SOC
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/29078
- DOI
- 10.1021/j100364a055
- ISSN
- 0022-3654
- Article Type
- Article
- Citation
- JOURNAL OF PHYSICAL CHEMISTRY, vol. 94, no. 1, page. 327 - 331, 1990-01-11
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- There are no files associated with this item.
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