Development of rapid mask fabrication technology for micro-abrasive jet machining
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SCOPUS
KCI
- Title
- Development of rapid mask fabrication technology for micro-abrasive jet machining
- Authors
- Lee, S; Kang, HW; Lee, SJ; Lee, I; Ko, T; Cho, DW
- Date Issued
- 2008-11
- Publisher
- KOREAN SOC MECHANICAL ENGINEERS
- Abstract
- Micro-machining of a brittle material such as glass or silicon is important in micro fabrication. Particularly, micro-abrasive jet machining (mu-AJM) has become a useful technique for micro-machining of such materials. The mu-AJM process is mainly based on the erosion of a mask which protects brittle substrate against high velocity of micro-particles. Therefore, fabrication of an adequate mask is very important. Generally, for the fabrication of a mask in the mu-AJM process, a photomask based on the semi-conductor fabrication process was used. In this research a rapid mask fabrication technology has been developed for the mu-AJM. By scanning the focused UV laser beam, a micro-mask pattern was fabricated directly without photolithography process and photomask. Therefore, rapid and economic mask fabrication can be possible for the micro-abrasive jet machining. Two kinds of mask patterns were fabricated by using SU-8 and photopolymer (Watershed 11110). Using fabricated mask patterns, abrasive-jet machining of Si wafer was conducted successfully.
- Keywords
- Mask, Micro-abrasive jet machining; SU-8; Photopolymer; Micro-stereolithography
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/27878
- DOI
- 10.1007/s12206-008-0607-2
- ISSN
- 1738-494X
- Article Type
- Article
- Citation
- JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY, vol. 22, no. 11, page. 2190 - 2196, 2008-11
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