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Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
- Title
- Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
- Authors
- Kyeong-Keun Choi; Jong Kee; Chan-Gyung Park; Deok-kee Kim; 박찬경
- Date Issued
- 2015-03
- Publisher
- The Japan Society of Applied Physics
- ISSN
- 1882-0778
- Article Type
- Article
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