Synthesis and properties of UV curable polyvinylsilazane as a precursor for microstructuring
SCIE
SCOPUS
- Title
- Synthesis and properties of UV curable polyvinylsilazane as a precursor for microstructuring
- Authors
- Li, YH; Ahn, KD; Kim, DP
- Date Issued
- 2015-03
- Publisher
- WILEY-BLACKWELL
- Abstract
- Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1-bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN-based ceramic microstructures. The acrylate-modified polymers (m-PVSZ) were characterized by H-1-NMR, C-13-NMR and FT-IR methods to determine the chemical reaction mechanism. Differential photo-calorimeter and FT-IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano-imprinting method; multi-layered octagon structures were fabricated by a two-photon absorption stereolithography process. The results indicate that m-PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright (c) 2015 John Wiley & Sons, Ltd.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/26797
- DOI
- 10.1002/PAT.3448
- ISSN
- 1042-7147
- Article Type
- Article
- Citation
- POLYMERS FOR ADVANCED TECHNOLOGIES, vol. 26, no. 3, page. 245 - 249, 2015-03
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