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Cited 39 time in webofscience Cited 18 time in scopus
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Plasma-Enhanced Atomic Layer Deposition of Ni

Title
Plasma-Enhanced Atomic Layer Deposition of Ni
Authors
Lee, HBRBang, SHKim, WHGu, GHLee, YKChung, TMKim, CGPark, CGKim, H
POSTECH Authors
Park, CG
Date Issued
May-2010
Publisher
JAPAN SOC APPLIED PHYSICS
Keywords
THIN-FILMS; NICKEL-OXIDE; METAL; NH3; SILICIDES; KINETICS; POLYMER; SIO2
URI
http://oasis.postech.ac.kr/handle/2014.oak/25533
DOI
10.1143/JJAP.49.05FA11
ISSN
0021-4922
Article Type
Article
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 49, no. 5, 2010-05
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박찬경PARK, CHAN GYUNG
Dept of Materials Science & Enginrg
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