Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation
SCIE
SCOPUS
- Title
- Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation
- Authors
- Jung, YJ; Kim, JI; Kang, TH; Ihm, K; Kim, KJ; Kim, B; Park, JW
- Date Issued
- 2005-02-01
- Publisher
- ACADEMIC PRESS INC ELSEVIER SCIENCE
- Abstract
- Benzaldimine monolayer was exposed to soft X-rays, and the involved chemical transformation was investigated using X-ray photoelectron spectra and near-edge X-ray absorption fine structure spectroscopy. The spectroscopy indicated that irradiation of soft X-ray (550 eV)-induced selective transformation of the imine group into a nonhydrolyzable one, i.e., the amine group. Utilizing the selective chemical transformation of the imine group with the soft X-ray irradiation, we were able to generate a micropattern. AFM images showed that the patterning with alternating surface topology was effective. The patterned monolayer was further modified with biotin and Cy3-tagged Streptavidin sequentially. Fluorescence images showed that the above molecules were selectively immobilized onto the amine-terminated region of the patterned surface. The current system is found to be more efficient than the predecessor, 4-nitrobenzaldimine monolayer. (C) 2004 Elsevier Inc. All rights reserved.
- Keywords
- soft X-ray; benzaldimine monolayer; X-ray photoelectron spectra (XPS); near edge X-ray absorption fine structure (NEXAFS) spectroscopy; pattern; AFM image; fluorescence image; ELECTRON-BEAM LITHOGRAPHY; SURFACE-DENSITY; THIN-LAYERS; AMINE GROUP; CLEAVAGE; GENERATION
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/24864
- DOI
- 10.1016/j.jcis.2004.08.120
- ISSN
- 0021-9797
- Article Type
- Article
- Citation
- JOURNAL OF COLLOID AND INTERFACE SCIENCE, vol. 282, no. 1, page. 241 - 247, 2005-02-01
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