X-ray scattering study of thermal nanopore templating in hybrid films of organosilicate precursor and reactive four-armed porogen
SCIE
SCOPUS
- Title
- X-ray scattering study of thermal nanopore templating in hybrid films of organosilicate precursor and reactive four-armed porogen
- Authors
- Yoon, J; Heo, K; Oh, W; Jin, KS; Jin, S; Kim, J; Kim, KW; Chang, TH; Ree, M
- Date Issued
- 2006-07-28
- Publisher
- IOP PUBLISHING LTD
- Abstract
- The miscibility and the mechanism for thermal nanopore templating in films prepared from spin-coating and subsequent drying of homogenous solutions of curable polymethylsilsesquioxane dielectric precursor and thermally labile, reactive triethoxysilyl-terminated four-armed poly(epsilon-caprolactone) porogen were investigated in detail by in situ two-dimensional grazing incidence small-angle x-ray scattering analysis. The dielectric precursor and porogen components in the film were fully miscible. On heating, limited aggregations of the porogen, however, took place in only a small temperature range of 100-140 degrees C as a result of phase separation induced by the competition of the curing and hybridization reactions of the dielectric precursor and porogen; higher porogen loading resulted in relatively large porogen aggregates and a greater size distribution. The developed porogen aggregates underwent thermal firing above 300 degrees C without further growth and movement, and ultimately left their individual footprints in the film as spherical nanopores.
- Keywords
- DIELECTRIC THIN-FILMS; BEHAVIOR; POLY(EPSILON-CAPROLACTONE); REFLECTIVITY; ANALOGS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/23925
- DOI
- 10.1088/0957-4484/17/14/022
- ISSN
- 0957-4484
- Article Type
- Article
- Citation
- NANOTECHNOLOGY, vol. 17, no. 14, page. 3490 - 3498, 2006-07-28
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.