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Cited 73 time in webofscience Cited 80 time in scopus
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Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

Title
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
Authors
Park, SJKim, WHLee, HBRMaeng, WJKim, H
POSTECH Authors
Kim, H
Date Issued
Jan-2008
Publisher
ELSEVIER SCIENCE BV
Keywords
Ru; atomic layer deposition; nucleation; roughness; C-V measurements; OXIDE THIN-FILMS; DIELECTRIC-CONSTANT; SR)TIO3 CAPACITORS; BOTTOM ELECTRODE; VAPOR-DEPOSITION; RU-ELECTRODES; TA2O5; OXYGEN; SIO2; (BA
URI
http://oasis.postech.ac.kr/handle/2014.oak/22937
DOI
10.1016/j.mee.2007.01.239
ISSN
0167-9317
Article Type
Article
Citation
MICROELECTRONIC ENGINEERING, vol. 85, no. 1, page. 39 - 44, 2008-01
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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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