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Oxygen-plasma-treated indium-tin-oxide films on nonalkali glass deposited by super density arc plasma ion plating SCIE SCOPUS

Title
Oxygen-plasma-treated indium-tin-oxide films on nonalkali glass deposited by super density arc plasma ion plating
Authors
Kim, SYHong, KSon, JHJung, GHLee, JLChoi, KHSong, KHAhn, KC
Date Issued
2008-02
Publisher
INST PURE APPLIED PHYSICS
Abstract
The effects of O-2 plasma treatment on both the chemical composition and work function of an indium-tin-oxide (ITO) film were investigated. ITO films were deposited on non-alkali glass substrate by super density arc plasma ion plating for application in active-matrix organic light-emitting diodes (OLEDs). The water contact angle decreased from 38 to 11 degrees as the ITO films were treated with O-2 plasma for 60 s at a plasma power of 150 W, indicating an increase in the hydrophilicity of the surface. It was found that there were no distinct changes in the microstructure or electrical properties of the ITO films with O-2 plasma treatment. Synchrotron radiation photoemission spectroscopy data revealed that O-2 plasma treatment decreased the amount of carbon contamination and increased the number of unscreened states of In3+ and (O-2)(2-) peroxo species. This played the role of increasing the work function of the ITO films by 1.7 eV. As a result, the turn-on voltage of the OLED decreased markedly from 24 to 8 V and the maximum luminance value of the OLED increased to 2500 cd/m(2).
Keywords
indium tin oxide; super density arc plasma ion plating; O(2) plasma treatment; synchrotron radiation photoemission spectroscopy; non-alkali glass; organic light-emitting diode; LIGHT-EMITTING-DIODES; THIN-FILMS; HOLE INJECTION; ITO; PERFORMANCE; OXIDATION; DEVICES; LAYER
URI
https://oasis.postech.ac.kr/handle/2014.oak/22813
DOI
10.1143/JJAP.47.862
ISSN
0021-4922
Article Type
Article
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 47, no. 2, page. 862 - 866, 2008-02
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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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