Effect of a shield on the formation of the superconducting phases in the Bi-Sr-Ca-Cu-O film deposited by off-axis sputtering

Abstract

In this study, we investigated the effect of a shield on the phase formation of the Bi-Sr-Ca-Cu-O film deposited by in-situ, off-axis sputtering Here we set up a semicircular shield in the normal direction to the substrate for the blocking of the oxygen anions flying linearly to the growing film. The resputtering of the superconducting film by the oxygen anions could be effectively suppressed by using the shield. Moreover, we could deposit the 2223 high-T-c phase at relatively low substrate temperatures from 590 degrees C to 640 degrees C even without the addition of Pb. As the substrate temperature was increased, the phase of the film, interestingly, was changed from the 2212 phase (or the 2212 phase plus the 2201 phase) to the 2223 phase and then to the 2212 phase again.