Characterization of a multilayer soft X-ray reflector fabricated by pulsed laser deposition
SCIE
SCOPUS
- Title
- Characterization of a multilayer soft X-ray reflector fabricated by pulsed laser deposition
- Authors
- Kim, DE; Lee, SM; Jeon, IJ; Yanagihara, M
- Date Issued
- 1998-05
- Publisher
- ELSEVIER SCIENCE BV
- Abstract
- A Mo/Si multilayer (ML) has been fabricated as a reflector in the soft X-ray spectral region by pulsed laser deposition (PLD), using the second harmonic of Nd/YAG pulsed laser (5 ns, 532 nm light). The ML structure was characterized by transmission electron microscopy (TEM), small-angle X-ray scattering (SAXS) and photoelectron spectroscopy for chemical analysis (ESCA). The near-normal incidence reflectivity in the spectral range of 14-17 nm was measured using a soft X-ray reflectometer based on a laser-produced plasma. The structural parameters were evaluated by fitting to both the SAXS profile and the soft X-ray reflectance measurement with asymmetric interface profile, roughness and composition taken into account. (C) 1998 Elsevier Science B.V.
- Keywords
- pulsed laser deposition; multilayer; soft X-ray reflectivity; small-angle X-ray scattering; EXTREME-ULTRAVIOLET; MIRRORS; MICROSCOPY
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/20768
- DOI
- 10.1016/S0169-4332(97)00699-5
- ISSN
- 0169-4332
- Article Type
- Article
- Citation
- APPLIED SURFACE SCIENCE, vol. 127, page. 531 - 535, 1998-05
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- There are no files associated with this item.
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