Microstructural effects on leakage current behavior of (Ba,Sr)TiO3 thin films for DRAM applications
SCIE
SCOPUS
- Title
- Microstructural effects on leakage current behavior of (Ba,Sr)TiO3 thin films for DRAM applications
- Authors
- Ahn, KH; Kim, S; Baik, S
- Date Issued
- 2001-01
- Publisher
- TAYLOR & FRANCIS LTD
- Abstract
- We have investigated the effects of microstructure on the leakage cur-rent behavior of Pt/(Ba,Sr)TiO3/Pt film capacitors. To single out the microstructural effects only, (Ba,Sr)TiO3 films of three different microstructures (granular, columnar, possibly epitaxial), but having an identical interfacial state density, were prepared using a seed layer by sputtering. The leakage behavior depends strongly on the film microstructure. Schottky emission dominates in the film composed of granular grains, while the epi-like film shows the higher leakage current and Fowler-Nordheim tunneling mechanism. Interestingly, the film of columnar grains shows tunneling at low temperatures and Schottky emission at high temperatures. We propose a model based on energy band diagrams explaining the results.
- Keywords
- (Ba,Sr)TiO3 film; leakage mechanism; Schottky emission; tunneling; INJECTION; (BA
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/19249
- ISSN
- 1058-4587
- Article Type
- Article
- Citation
- INTEGRATED FERROELECTRICS, vol. 38, no. 1-4, page. 939 - 948, 2001-01
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