Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength
SCIE
SCOPUS
- Title
- Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength
- Authors
- Lee, SY; Hur, SM; Kim, HJ; Yoon, CS; Lee, YT; Kang, IY; Chung, YC; Yi, M; Bok, CK; Kim, O; Ahn, J
- Date Issued
- 2002-06
- Publisher
- INST PURE APPLIED PHYSICS
- Abstract
- Mo/Si multilayers deposited by sputtering for application to extreme-ultraviolet (EUV) reflectors have been characterized. Si rice the control of d-spacing is critical for achieving higher reflectivity. an effective and accurate d-spacing measurement technology is required. Although cross-sectional transmission electron microscope (TEM) and low-angle X-ray diffraction (XRD) are standard methods for evaluating multilayers. they provide different d-spacing values front each other. Cross-sectional TIN images can allow direct measurement of individual layers and cannot reveal tire optical behavior of the multilayer. On the other hand, low-angle XRD analysis can provide the resultant d-spacing which includes nonideal factors. As a result look-angle XRD can predict the EUV peak position more precisely than TEM analysis.
- Keywords
- EUVL; NGL; Mo/Si; multilayer; reflectivity; d-spacing; RESOLUTION ELECTRON-MICROSCOPY; MO-SI MULTILAYER; LITHOGRAPHY; MIRRORS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/18964
- DOI
- 10.1143/JJAP.41.4086
- ISSN
- 0021-4922
- Article Type
- Article
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 41, no. 6B, page. 4086 - 4090, 2002-06
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