Atomic force microscopy study of the polymeric nanotemplate fabricated via a microphase separation and subsequent selective etching of (PS-b-PI) copolymer thin film
SCIE
SCOPUS
- Title
- Atomic force microscopy study of the polymeric nanotemplate fabricated via a microphase separation and subsequent selective etching of (PS-b-PI) copolymer thin film
- Authors
- Park, J; Ha, JS; Ryu, J; Chang, TY
- Date Issued
- 2004-02
- Publisher
- INST PURE APPLIED PHYSICS
- Abstract
- We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M-w = 85000, and M-w/M-n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hcp) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF4+ ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.
- Keywords
- block copolymer; self-assembly; nanotemplate; atomic force microscopy; microphase separation; LITHOGRAPHY; ARRAYS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/18013
- DOI
- 10.1143/JJAP.43.762
- ISSN
- 0021-4922
- Article Type
- Article
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 43, no. 2, page. 762 - 766, 2004-02
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.