Acrylation of polyvinylsilazane with allyl bromide for an UV photosensitive inorganic polymer
SCIE
SCOPUS
- Title
- Acrylation of polyvinylsilazane with allyl bromide for an UV photosensitive inorganic polymer
- Authors
- Li, YH; Li, XD; Kim, DP
- Date Issued
- 2007-11-01
- Publisher
- Elsevier B.V
- Abstract
- novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by H-1 NMR and 2D-H-1-H-1 NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating nonoxide ceramic microstructures using mold free photocuring shaping processes. (c) 2007 Elsevier B.V. All rights reserved.
- Keywords
- inorganic polymer; polyvinylsilazane; photoresist; UV sensitivity; CERAMIC MICROSTRUCTURES; FABRICATION; MEMS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/16067
- DOI
- 10.1016/J.JORGANCHEM.2007.08.016
- ISSN
- 0022-328X
- Article Type
- Article
- Citation
- Journal of Organometallic Chemistry, vol. 692, no. 23, page. 5303 - 5306, 2007-11-01
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