Strain-relieving ridge structure in a wetting layer on the W(110) surface
SCIE
SCOPUS
- Title
- Strain-relieving ridge structure in a wetting layer on the W(110) surface
- Authors
- Kim, TH; Seo, J; Choi, J; Choi, BY; Song, YJ; Kuk, Y; Kahng, SJ
- Date Issued
- 2005-12-05
- Publisher
- Elsevier B. V.
- Abstract
- The growth behavior and atomic structure of the Ag wetting layer grown on the W(110) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3 3 7] and [3 3 7] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images. (c) 2005 Published by Elsevier B.V.
- Keywords
- scanning tunneling microscopy; epitaxy; nanostructures; surface structure; SCANNING-TUNNELING-MICROSCOPY; GROWTH; FILMS; AU; AG; CU
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/15103
- DOI
- 10.1016/J.SUSC.2005.07.034
- ISSN
- 0039-6028
- Article Type
- Article
- Citation
- Surface Science, vol. 595, no. 1-3, page. 30 - 34, 2005-12-05
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- There are no files associated with this item.
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