Open Access System for Information Sharing

Login Library

 

Article
Cited 2 time in webofscience Cited 4 time in scopus
Metadata Downloads

The removal of 10-nm contaminant particles from micron-scale trenches using CO2 nano bullets SCIE SCOPUS

Title
The removal of 10-nm contaminant particles from micron-scale trenches using CO2 nano bullets
Authors
Kim, ILee, J
Date Issued
2013-04
Publisher
SPRINGER
Abstract
The removal of nano-sized contaminant particles (CPs) from trenches formed on Si wafer is an important issue in the semiconductor industry. The particle beam technique, which is an advanced aerosol cleaning technique using nano-sized bullet particles (BPs) shot at supersonic velocity, has successfully cleaned CPs on flat surfaces down to 10 nm. In this paper, the same technique was applied to the removal of 10 nm Al2O3 particles from micron-scale trenches using CO2 nano bullets. Trenches of 4, 10, and 20 mu m depth were fabricated at 2 mu m and 50 mu m widths, with a maximum aspect ratio of 10. When nano-sized bullets were shot into the contaminated trenches, 10 nm contaminants deposited on the side walls, bottom surfaces, and corners were completely removed from a variety of trenches in just a few seconds. Cleaning efficiency greater than 95 % was attained. Size and velocity of the BPs were the important parameters affecting removal of CPs in the 10 nm size range from micron-scale trenches.
Keywords
Nano-bullet; CO2; Trench; Supersonic speed; Cleaning efficiency; CONTOURED LAVAL NOZZLE; BEAM
URI
https://oasis.postech.ac.kr/handle/2014.oak/14145
DOI
10.1007/S11051-013-1579-4
ISSN
1388-0764
Article Type
Article
Citation
JOURNAL OF NANOPARTICLE RESEARCH, vol. 15, no. 4, 2013-04
Files in This Item:
There are no files associated with this item.

qr_code

  • mendeley

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher

이진원LEE, JIN WON
Dept of Mechanical Enginrg
Read more

Views & Downloads

Browse