Open Access System for Information Sharing

Login Library

 

Article
Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

High Speed, Low Power Programming in 0.17mum Channel Length NOR-type Floating Gate Flash Memory Cell Free of Drain Turn-On Effects SCIE SCOPUS

Title
High Speed, Low Power Programming in 0.17mum Channel Length NOR-type Floating Gate Flash Memory Cell Free of Drain Turn-On Effects
Authors
Baek, CKSong, YHKim, BQuan, WYPark, YJMin, HSKim, DM
Date Issued
2004-02-01
Publisher
The Japan Society of Applied Physics
Abstract
We present a fast low power programming in floating gate electrically erasable and programmable read only memory (EEPROM) cells with the aspect ratio of 0.09 / 0.17 mum. The threshold voltage shift (Delta V-TH) of 5V, for example, was done in less than I mus, using the peak drain current (I-D) of approximate to100muA. More importantly, by using the substrate bias (V-B), programming was done in 2-3 mus at I-D of 30 muA and V-D of 3V. This observed speed is faster than reported values by about 2.5 and power used was about 50% lower than the previous one. The optimal programming bias conditions are presented, together with the reasons for fast programming.
Keywords
NOR-type flash EEPROM; low power programming; substrate bias effect; drain turn-on; high speed programming; VLSI MOSFETS; PART I; EEPROM
URI
https://oasis.postech.ac.kr/handle/2014.oak/13707
DOI
10.1143/JJAP.43.L224
ISSN
0021-4922
Article Type
Article
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, vol. 43, no. 2A, page. L224 - L226, 2004-02-01
Files in This Item:
There are no files associated with this item.

qr_code

  • mendeley

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher

백창기BAEK, CHANG KI
Dept. Convergence IT Engineering
Read more

Views & Downloads

Browse