Reversible Basal Plane Hydrogenation of Graphene
SCIE
SCOPUS
- Title
- Reversible Basal Plane Hydrogenation of Graphene
- Authors
- Ryu, Sunmin; Han, Melinda Y.; Maultzsch, Janina; Heinz, Tony F.; Kim, Philip; Steigerwald, Michael L.; Brus, Louis E.
- Date Issued
- 2008-12
- Publisher
- American Chemical Society (ACS)
- Abstract
- We report the chemical reaction of single-layer graphene with hydrogen atoms, generated in situ by electron-induced dissociation of hydrogen silsesquioxane (HSQ). Hydrogenation, forming sp 3 C-H functionality on the basal plane of graphene, proceeds at a higher rate for single than for double layers, demonstrating the enhanced chemical reactivity of single sheet graphene. The net H atom sticking probability on single layers at 300 K is at least 0.03, which exceeds that of double layers by at least a factor of 15. Chemisorbed hydrogen atoms, which give rise to a prominent Raman D band, can be detached by thermal annealing at 100∼200 °C. The resulting dehydrogenated graphene is "activated" when photothermally heated it reversibly binds ambient oxygen, leading to hole doping of the graphene. This functionalization of graphene can be exploited to manipulate electronic and charge transport properties of graphene devices. © 2008 American Chemical Society.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/120198
- DOI
- 10.1021/nl802940s
- ISSN
- 1530-6984
- Article Type
- Article
- Citation
- Nano Letters, vol. 8, no. 12, page. 4597 - 4602, 2008-12
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