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Sensitivity Analysis of Each Inner Spacer Thickness Variation in Sub 3-nm Node Si Nanosheet FETs
- Title
- Sensitivity Analysis of Each Inner Spacer Thickness Variation in Sub 3-nm Node Si Nanosheet FETs
- Date Issued
- 2022-01-25
- Publisher
- KCS
- Article Type
- Conference
- Citation
- 제 29회 한국반도체학술대회, 2022-01-25
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg