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Improving the SiGeAsTe Ovonic Threshold Switching (OTS) Characteristics by Microwave Annealing for Excellent Endurance (> 1011) and Low Drift Characteristics

Title
Improving the SiGeAsTe Ovonic Threshold Switching (OTS) Characteristics by Microwave Annealing for Excellent Endurance (> 1011) and Low Drift Characteristics
Authors
JANGSEOP, LEEKIM, SEONGHUNLEE, SANGMINSANGHYUN, BANSEONGJAE, HEOLee, DonghwaMosendz, OleksandrHwang, Hyunsang
Date Issued
2022-06-15
Publisher
Institute of Electrical and Electronics Engineers Inc.
Abstract
To improve the reliability of a nanoscale (d=30 nm) ovonic threshold switching (OTS) selector, we report for the first time the effect of microwave annealing (MWA) on the electrical characteristics of an OTS device. The MWA-treated OTS device shows low initial forming voltage, excellent endurance (> 1011), and reduced threshold voltage (Vth) drift (- 67 %), while maintaining its great switching characteristics (Ioff = 0.8 nA at 1.1 V). Enhanced As-Te bonding probability after MWA, which was confirmed by Raman spectroscopy and density functional theory (DFT) calculations, can explain low forming voltage and improved device reliability.
URI
https://oasis.postech.ac.kr/handle/2014.oak/116387
Article Type
Conference
Citation
2022 IEEE Symposium on VLSI Technology and Circuits, VLSI Technology and Circuits 2022, page. 320 - 321, 2022-06-15
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