Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating
SCIE
SCOPUS
- Title
- Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating
- Authors
- Chen, YT; Lo, TN; Chiu, CW; Wang, JY; Wang, CL; Liu, CJ; Wu, SR; Jeng, ST; Yang, CC; Shiue, J; Chen, CH; Hwu, Y; Yin, GC; Lin, HM; Je, JH; Margaritondo, G
- Date Issued
- 2008-03
- Publisher
- BLACKWELL PUBLISHING
- Abstract
- The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm. (C) 2008 International Union of Crystallography.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/11037
- DOI
- 10.1107/S0909049507063510
- ISSN
- 0909-0495
- Article Type
- Article
- Citation
- JOURNAL OF SYNCHROTRON RADIATION, vol. 15, page. 170 - 175, 2008-03
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- There are no files associated with this item.
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