Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared
SCIE
SCOPUS
- Title
- Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared
- Authors
- LEE, DASOL; GO, MYEONGCHEOL; KIM, MINK YUNG; JANG, JUN HO; CHOI, CHUNG RYONG; KIM, JIN KON; RHO, JUNSUK
- Date Issued
- 2021-03
- Publisher
- Nature Publishing Group | Chinese Academy of Sciences, Institute of Electronics
- Abstract
- Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials, respectively. Here, we demonstrate a thermally robust titanium nitride broadband absorber with >95% absorption efficiency in the visible and near-infrared region (400-900 nm). A relatively large-scale (2.5 cm x 2.5 cm) absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures >600 C-circle. Such a large-scale, heat-tolerant, and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth, and absorption controlling in high-temperature conditions.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/105155
- DOI
- 10.1038/s41378-020-00237-8
- ISSN
- 2055-7434
- Article Type
- Article
- Citation
- Microsystems & Nanoengineering, vol. 7, no. 14, page. 1 - 8, 2021-03
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