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CHARACTERIZATION AND REMOVAL OF SILICON SURFACE RESIDUE RESULTING FROM CHF3/C2F6 REACTIVE ION ETCHING

Title
CHARACTERIZATION AND REMOVAL OF SILICON SURFACE RESIDUE RESULTING FROM CHF3/C2F6 REACTIVE ION ETCHING
Authors
CHO, KIKWON, KHKWON, OJLEE, JLPARK, HHPARK, SCSUH, KS
POSTECH Authors
LEE, JL
Date Issued
Jan-1994
Publisher
AMER INST PHYSICS
URI
http://oasis.postech.ac.kr/handle/2014.oak/10452
ISSN
0021-8979
Article Type
Article
Citation
JOURNAL OF APPLIED PHYSICS, vol. 76, page. 4596 - 4602, 1994-01
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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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