Composition and thickness uniformity of chemical vapor deposited barium strontium titanate films on a patterned structure

Abstract

Step coverage and composition uniformity on a patterned structure were studied in the direct liquid injection metallorganic chemical deposition of barium strontium titanate film. When Ti(mpd)(tmhd)(2), (mpd is methylpentanediol), (tmhd is tetramethylheptanedionate) was used as a titanium source, titanium incorporation and deposition rate were determined by the surface reaction when the deposition temperature was lower than 480 degreesC and excess titanium source was used to reach the right composition of the film, especially at low deposition temperatures. In this case, the nonuniform distribution of Ti on a patterned structure was observed because, inside the trench, the mass-transfer rate became substantially lower. When Ti(dmae)(4) (dmae is dimethylaminoethoxide) was used, the deposition rate and Ti incorporation were determined by mass transfer and the Ti incorporation was uniform on the patterned surface. (C) 2000 The Electrochemical Society. S1099-0062(00)06-109-5. All rights reserved.