Open Access System for Information Sharing

Login Library

OASIS Repository@POSTECHLIBRARY

Browsing by AuthorNam, WH

전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

All 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:

Sort by:
In order:
Results/Page
Authors/Record:

Showing results 1 to 3 of 3

Article

Atomic layer chemical vapor deposition (ALCVD) of Hf and Zr silicate and aluminate high-k gate dielectric for next generation nano devicesSCIESCOPUS

JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, vol. 38, no. 8, page. 578 - 587, 2005-08

Article

Atomic layer deposition of hafnium silicate thin films using HfCl2[N-SiMe3)(2)](2) and H2OSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 7, no. 4, page. C55 - C56, 2004-01

Article

Atomic layer deposition of ZrO2 thin films using dichlorobis [bis-(trimethylsilyl)amido] zirconium and waterSCIESCOPUS

CHEMICAL VAPOR DEPOSITION, vol. 10, no. 4, page. 201 - 205, 2004-09

1

OAK

개인정보처리방침 Personal Information Protection Policy

library@postech.ac.kr Tel: 054-279-2548

Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.

Browse

Login Library Help