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Article
Low-Temperature Fabrication (≤150 °C) of High-Quality Sputtered Silicon Oxide Thin Film with Hydrogen Plasma Treatment
SCIE
SCOPUS
Acs Applied Electronic Materials, vol. 2, no. 10, page. 3320 - 3326, 2020-10-27
Seo
;
Park
;
Jeon
;
Yun
;
Park
;
et al
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