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KIM, HYUNGJUN(김형준)
Department
Dept of Materials Science & Engineering(신소재공학과)
Major(s)
-

Co-researchers

    Keyword

    Publication & Time Cited Count (For the Last 5 years)

    Results 21-40 of 97 (Search time: 0.002 seconds).
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    Conference
    The applications of atomic layer deposition to nanodevices and nanotechnology

    The 9th Korea-China Workshop on Advanced Materials, 2005-10-01

    Conference
    The ALD of various oxides from alkylamide precursors: the growth and film properties

    5th American Vacuum Society Topical Conference on Atomic Layer Deposition, 2005-08-01

    Conference
    The application of ALD for metallization of 65nm and beyond

    The 3rd Asian Conference on Chemical Vapor Deposition, 2004-11-01

    Conference
    Thermally robust dual-work function ALD-MNx MOSFETs using conventional CMOS process flow

    VLSI Tech. Digest, page. 167 - 168, 2004-07-01

    Conference
    The Application of plasma for metal atomic layer deposition (ALD) for Cu Interconnect Technology

    American Vacuum Society, 2003-11-01

    Conference
    Metal Electrodes and Metal Gates by Atomic Layer Deposition

    American Vacuum Society, 2003-08-01

    Conference
    Halide and metal organic based plasma-enhanced ALD of TaNx for Cu interconnect technology

    American Vacuum Society, 2003-08-01

    Conference
    Does line edge roughness matter?: FEOL and BEOL perspectives

    Advances in Resist Technology and Processing, page. 1076 - 1085, 2003-06-01

    Conference
    The Application of plasma for metal atomic layer deposition (ALD) for Cu Interconnect Technology

    Semiconductor Fabtech, 2003-05-01

    Conference
    The PE-ALD of Ta Based Metals/Nitrides: The Growth, Materials Properties, and Applications to Future Device Fabrication

    American Vacuum Society, 2002-12-01

    Conference
    The PE-ALD of Ta Based Metals/Nitrides: The Growth, Materials Properties, and Applications to Future Device Fabrication

    American Vacuum Society, 2002-11-01

    Conference
    The Growth and Properties of PE-ALD Ta and TaN thin Films

    American Vacuum Society, 2002-08-01

    Conference
    Process Integration of Self-Assembled Polymer Templates into Silicon Nanofabrication

    Electron, Ion, and Photon Beam Technology and Nanofabrication, 2002-05-01

    Conference
    The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties

    Mat. Res. Soc., 2002-04-01

    Conference
    Growth Kinetics and Initial Stage Growth during Ti Plasma Enhanced-Atomic Layer Deposition

    American Vacuum Society, 2001-08-01

    Conference
    Boron Surface Segregation and Film Growth Kinetics during Ultra Highly Doped Si1-xGex(001):B Gas-Source Molecular Beam Epitaxy

    Materials Research Society Spring Meeting, 2001-05-01

    Conference
    From PVD to CVD to ALD for Interconnects and Related Applications

    Proceedings of IEEE International Interconnect Technology Conference, 2001-05-01

    Conference
    Carbon Lattice Site Distributions in Epitaxial Si1-yCy Grown on Si(001) by Molecular Beam Epitaxy: An X-Ray Diffraction, Ab-Initio Calculation, and Ph

    Materials Research Society Spring Meeting, 2001-04-01

    Conference
    Si(001):As gas-source molecular beam epitaxy: As incorporation and film growth kinetics

    American Vacuum Society, 2000-05-01

    Conference
    Hydrogen Mediated Surface Morphological Evolution in Si0.7Ge0.3/Si(001) Layers Grown by Hydride Gas-Source Molecular Beam Epitaxy

    American Vacuum Society, 1999-10-01

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