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KIM, HYUNGJUN(김형준)
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Dept of Materials Science & Engineering(신소재공학과)
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Publication & Time Cited Count (For the Last 5 years)
Results 1-1 of 1 (Search time: 0.001 seconds).
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Date issued
2006
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Article
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CHEMICAL-VAPOR-DEPOSITION
1
CHEMISTRY
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DIFFUSION BARRIER
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GROWTH
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HAFNIUM
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HFO2
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METAL
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NITRIDE
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SILICON
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TANTALUM OXIDE
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: NITRIDE
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: METAL
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Article
Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
SCIE
SCOPUS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 24, no. 5, page. 2276 - 2281, 2006-09
Maeng, WJ
;
Park, SJ
;
Kim, H
1
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