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Cited 32 time in webofscience Cited 31 time in scopus
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dc.contributor.authorLee, W-
dc.contributor.authorPark, J-
dc.contributor.authorKim, S-
dc.contributor.authorWoo, J-
dc.contributor.authorShin, J-
dc.contributor.authorLee, D-
dc.contributor.authorCha, E-
dc.contributor.authorHwang, H-
dc.date.accessioned2015-06-25T01:28:14Z-
dc.date.available2015-06-25T01:28:14Z-
dc.date.created2013-03-08-
dc.date.issued2012-04-02-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000027037en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9748-
dc.description.abstractWe demonstrate improved switching uniformity in resistive random-access memory (RRAM) containing metal-doped electrolyte due to thermally agglomerated metallic filaments. Rapid thermal annealing (RTA) produced copper-doped carbon (CuC) devices that exhibited better switching parameters, such as on/off resistance and set/reset voltage, than a control device. High-resolution transmission electron microscopy, electron dispersive spectroscopy, and conductive atomic force microscopy revealed that Cu atoms were agglomerated during the RTA process and formed a Cu filament in the CuC film. Consequently, the forming process can be eliminated, which is desirable for practical RRAM applications. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3700730]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAmerican Institute of Physics Inc..-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleImproved switching uniformity in resistive random access memory containing metal-doped electrolyte due to thermally agglomerated metallic filaments-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.3700730-
dc.author.googleLee, Wen_US
dc.author.googlePark, Jen_US
dc.author.googleHwang, Hen_US
dc.author.googleCha, Een_US
dc.author.googleLee, Den_US
dc.author.googleShin, Jen_US
dc.author.googleWoo, Jen_US
dc.author.googleKim, Sen_US
dc.relation.volume100en_US
dc.relation.issue14en_US
dc.contributor.id10079928en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.100, no.14-
dc.identifier.wosid000302567800032-
dc.date.tcdate2019-01-01-
dc.citation.number14-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume100-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84859802664-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc18-
dc.description.scptc19*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusCOPPER-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusOXYGEN-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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