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Cited 14 time in webofscience Cited 13 time in scopus
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dc.contributor.authorShin, K-
dc.contributor.authorYang, SY-
dc.contributor.authorYang, C-
dc.contributor.authorJeon, H-
dc.contributor.authorPark, CE-
dc.date.accessioned2015-06-25T01:18:06Z-
dc.date.available2015-06-25T01:18:06Z-
dc.date.created2009-03-17-
dc.date.issued2007-07-09-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000006998en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9588-
dc.description.abstractThe authors fabricated pentacene transistors with high mobilities by controlling the morphology of pentacene film through adjustments to the surface energy of the gate dielectrics with oxygen plasma treatment, and then by improving the interfacial properties through postaging. The increased surface energy of poly(methylmethacrylate) dielectric that results from the oxygen plasma treatment improves the interconnections between grains and enlarges the grain size. The postaging of transistors is presumed to rearrange the interface functional groups and as a result decrease the polar functionality without changing pentacene film morphology, which reduces the number of trap states and increases the mobility to 0.73 cm(2)/V s. (C) 2007 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleOxygen plasma treatment and postaging of pentacene field-effect transistors for improved mobility-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.identifier.doi10.1063/1.2756321-
dc.author.googleShin, Ken_US
dc.author.googleYang, SYen_US
dc.author.googlePark, CEen_US
dc.author.googleJeon, Hen_US
dc.author.googleYang, Cen_US
dc.relation.volume91en_US
dc.relation.issue2en_US
dc.contributor.id10104044en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.91, no.2-
dc.identifier.wosid000248017300103-
dc.date.tcdate2019-01-01-
dc.citation.number2-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume91-
dc.contributor.affiliatedAuthorPark, CE-
dc.identifier.scopusid2-s2.0-34547172642-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc12-
dc.description.scptc12*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusMORPHOLOGY-
dc.subject.keywordPlusLAYER-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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박찬언PARK, CHAN EON
Dept. of Chemical Enginrg
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