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Cited 44 time in webofscience Cited 96 time in scopus
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dc.contributor.authorLee, D.-
dc.contributor.authorLee, J.W.-
dc.contributor.authorJang, J.-
dc.contributor.authorShin, I.-S.-
dc.contributor.authorJin, L.-
dc.contributor.authorPark, J.H.-
dc.contributor.authorKim, J.-
dc.contributor.authorLee, J.-
dc.contributor.authorNoh, H.-S.-
dc.contributor.authorKim, Y.-I.-
dc.contributor.authorPark, Y.-
dc.contributor.authorLee, G.-D.-
dc.contributor.authorPark, Y.-
dc.contributor.authorKim, J.K.-
dc.contributor.authorYoon, E.-
dc.date.accessioned2018-07-17T10:45:47Z-
dc.date.available2018-07-17T10:45:47Z-
dc.date.created2017-12-21-
dc.date.issued2017-05-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/92103-
dc.description.abstractWe demonstrated AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) with periodic air-voids-incorporated nanoscale patterns enabled by nanosphere lithography and epitaxial lateral overgrowth (ELO) on a 4-in. sapphire substrate. The nanoscale ELO improved the crystal quality of overgrown epitaxial layers at a relatively low growth temperature of 1050 ��C and at small coalescence thickness less than 2 ��m. The light output power of the DUV LED was enhanced significantly by 67% at an injection current of 20 mA. We attribute such a remarkable enhancement to the formation of embedded periodic air voids which cause simultaneous improvements in the crystal quality of epitaxial layers by ELO and light extraction efficiency enabled by breaking the predominant in-plane guided propagation of DUV photons. ? 2017 Author(s).-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.subjectEpitaxial growth-
dc.subjectLight-
dc.subjectNanotechnology-
dc.subjectSapphire-
dc.subjectSubstrates-
dc.subjectSuperconducting films-
dc.subjectUltraviolet radiation-
dc.subjectDeep-ultraviolet light-emitting diodes-
dc.subjectEpitaxial lateral overgrowth-
dc.subjectGuided propagation-
dc.subjectInjection currents-
dc.subjectLight-extraction efficiency-
dc.subjectLow growth temperature-
dc.subjectNano Sphere Lithography-
dc.subjectNano-scale patterns-
dc.subjectLight emitting diodes-
dc.titleImproved performance of AlGaN-based deep ultraviolet light-emitting diodes with nano-patterned AlN/sapphire substrates-
dc.typeArticle-
dc.identifier.doi10.1063/1.4983283-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.110, no.19-
dc.identifier.wosid000402319200003-
dc.date.tcdate2019-02-01-
dc.citation.number19-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume110-
dc.contributor.affiliatedAuthorKim, J.K.-
dc.identifier.scopusid2-s2.0-85019262037-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc1-
dc.type.docTypeArticle-
dc.subject.keywordPlusLATERAL OVERGROWTH-
dc.subject.keywordPlusALN-
dc.subject.keywordPlusTEMPERATURE-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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김종규KIM, JONG KYU
Dept of Materials Science & Enginrg
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