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dc.contributor.author강봉구-
dc.date.accessioned2018-06-15T07:48:06Z-
dc.date.available2018-06-15T07:48:06Z-
dc.date.created2009-08-13-
dc.date.issued1999-05-09-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/52788-
dc.publisherThe 4th International Symposium on Plasma Process-Induced Damage-
dc.relation.isPartOfThe 4th International Symposium on Plasma Process-Induced Damage-
dc.titleEffect of Low Temperature Deuterium Annealing on Plasma-Process Induced Damage-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationThe 4th International Symposium on Plasma Process-Induced Damage-
dc.citation.conferenceDate1999-05-09-
dc.citation.conferencePlaceUS-
dc.citation.titleThe 4th International Symposium on Plasma Process-Induced Damage-
dc.contributor.affiliatedAuthor강봉구-
dc.description.journalClass1-
dc.description.journalClass1-

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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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